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An 80x80 Microbolometer Type Thermal Imaging Sensor using the LWIR-Band CMOS Infrared (CIR) Technology

机译:使用LWIR波段CMOS红外(CIR)技术的80x80微辐射热计型热成像传感器

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This paper introduces an 80x80 microbolometer array with a 35 µm pixel pitch operating in the 8-12 µm wavelength range, where the detector is fabricated with the LWIR-band CMOS infrared technology, shortly named as CIR, which is a novel microbolometer implementation technique developed to reduce the detector cost in order to enable the use of microbolometer type sensors in high volume markets, such as the consumer market and IoT. Unlike the widely used conventional surface micromachined microbolometer approaches, MikroSens' CIR detector technology does not require the use of special high TCR materials like VOx or a-Si, instead, it allows to implement microbolometers with standard CMOS layers, where the suspended bulk micromachined structure is obtained by only few consecutive selective MEMS etching steps while protecting the wirebond pads with a simple lithograpy step. This approach not only reduces the fabrication cost but also increases the production yield. In addition, needing simple subtractive post-CMOS fabrication steps allows the CIR technology to be carried out in any CMOS and MEMS foundry in a truly fabless fashion, where industrially mature and Au-free wafer level vacuum packaging technologies can also be carried out, leading to cost advantage, simplicity, scalability, and flexibility. The CIR approach is used to implement an 80x80 FPA with 35 µm pixel pitch, namely MS0835A, using a 0.18 µm CMOS process. The fabricated sensor is measured to provide NETD (Noise Equivalent Temperature Difference) value of 163 mK at 17 fps (frames per second) and 71 mK at 4 fps with F/1.0 optics in a dewar environment. The measurement results of the wafer level vacuum packaged sensors with one side AR coating shows an NETD values of 112 mK at 4 fps with F/l.l optics, i.e., demonstrates a good performance for high volume low-cost applications like advanced presence detection and human counting applications. The CIR approach of MikroSens is scalable and can be used to reduce the pixel pitch even further while increasing the array size if necessary for various other low-cost, high volume applications.
机译:本文介绍了一种80x80微型测辐射热仪阵列,其像素间距为35 µm,工作在8-12 µm波长范围内,该探测器采用LWIR波段CMOS红外技术(简称为CIR)制造,这是一种新型的测微辐射热仪实现技术为了降低检测器成本,以便能够在消费市场和物联网等大批量市场中使用测微辐射热计式传感器。与广泛使用的常规表面微机械测微辐射计方法不同,MikroSens的CIR检测器技术不需要使用特殊的高TCR材料(如VOx或a-Si),而是允许在具有标准CMOS层的微测辐射热计中使用,该系统具有悬浮的本体微机械结构通过仅几个连续的选择性MEMS刻蚀步骤即可获得,同时通过简单的光刻工艺保护引线键合焊盘。这种方法不仅降低了制造成本,而且提高了产量。此外,仅需简单的减法后CMOS制造步骤,就可以在任何CMOS和MEMS代工厂中以真正的无晶圆厂方式实施CIR技术,从而可以在工业上成熟并且实现无金晶圆级真空封装技术,从而实现领先具有成本优势,简单性,可扩展性和灵活性。 CIR方法用于通过0.18 µm CMOS工艺实现具有35 µm像素间距的80x80 FPA,即MS0835A。在杜瓦瓶中使用F / 1.0光学元件时,对制成的传感器进行测量以提供NETD(噪声等效温度差)值,在17 fps(每秒帧数)下为163 mK,在4 fps下为71 mK。带有AR涂层的晶圆级真空包装传感器的测量结果显示,采用F / ll光学元件,在4 fps下的NETD值为112 mK,即证明了对大量低成本应用(如高级状态检测和人像)的良好性能计数申请。 MikroSens的CIR方法具有可扩展性,可以用于减少像素间距,同时还可在其他各种低成本,大批量应用中根据需要增加阵列尺寸。

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