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THREE-DIMENSIONAL FLOW OF SILICON MELT IN A ROTATING SHALLOW ANNULAR POOL

机译:旋转浅环形池中硅熔体的三维流动

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In order to understand the mechanism of the surface patterns on silicon melt in Czochralski furnaces, we conducted a series of unsteady three-dimensional numerical simulations of silicon melt flow in a rotating shallow annular pool in the counter-clockwise direction under micro-gravity. The pool is heated from the outer cylindrical wall and cooled at the bottom of an inner cylinder. The temperature differences between the vertical outer wall and the inner wall are 16 K, 21 K, 26 K and 32 K. Bottom and top surfaces of the melt pool are adiabatic. When the rotation rate is very slow, the hydrothermal waves are dominant in the pool and propagate in a direction opposite to the pool rotation. When the rotation rate exceeds the first critical value, the phase velocity of the hydrothermal waves increases rapidly and its propagating direction becomes same as that of the pool rotation. With much larger rotation rate, the flow becomes an axisymmetric steady flow. Details of the flow and temperature disturbances are discussed and the critical rotation rates are determined.
机译:为了了解Czochralski熔炉中硅熔体表面图案的机理,我们在微重力作用下,对旋转的浅环形池中的硅熔体在逆时针方向上的流动进行了一系列非定常的三维数值模拟。该池从外圆柱壁加热并在内圆柱体的底部冷却。垂直外壁和内壁之间的温差为16 K,21 K,26 K和32K。熔池的底部和顶部表面是绝热的。当旋转速度非常慢时,热液波在池中占主导地位,并以与池旋转相反的方向传播。当旋转速率超过第一临界值时,热液波的相速度迅速增加,其传播方向变得与池旋转的方向相同。旋转速率大得多时,该流变为轴对称稳定流。讨论了流量和温度扰动的细节,并确定了临界转速。

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