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Growth Kinetics and Uniform Scaling-up of Graphene Synthesis

机译:石墨烯合成的生长动力学和均匀放大

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摘要

Chemical vapor deposition on copper is the most widely used method to synthesize graphene at large scale. However, the clear understanding of the fundamental mechanisms that govern this synthesis is lacking. Using a vertical-flow, cold-wall reactor with short gas residence time we observe the early growths to study the kinetics of chemical vapor deposition of graphene on copper foils and demonstrate uniform synthesis at wafer scale. Our results indicate that the growth is limited by the catalytic dissociative dehydrogenation on the surface and copper sublimation hinders the graphene growth. We report an activation energy of 3.1 eV for ethylene-based graphene synthesis.
机译:在铜上化学气相沉积是最广泛使用的大规模合成石墨烯的方法。但是,缺乏对控制这种合成的基本机制的清楚理解。使用具有短气体停留时间的垂直流冷壁反应器,我们观察到了早期的生长,以研究石墨烯在铜箔上化学气相沉积的动力学,并证明了晶圆级的均匀合成。我们的结果表明,生长受到表面催化解离脱氢的限制,铜的升华阻碍了石墨烯的生长。我们报道了基于乙烯的石墨烯合成的活化能为3.1 eV。

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    Department of Mechanical and Process Engineering, ETH Zurich, Zurich CH-8092, Switzerland;

    Department of Engineering, Electrical Engineering Division, University of Cambridge, Cambridge CB30FA, UK,Aixtron Ltd. Nanoinstruments, Swavesey, Cambridge CB244FQ, UK;

    Aixtron Ltd. Nanoinstruments, Swavesey, Cambridge CB244FQ, UK;

    Aixtron Ltd. Nanoinstruments, Swavesey, Cambridge CB244FQ, UK;

    Department of Electrical and Computer Engineering, University of Texas at Austin, Austin, Texas 78712, USA;

    Department of Electrical and Computer Engineering, University of Texas at Austin, Austin, Texas 78712, USA;

    Department of Engineering, Electrical Engineering Division, University of Cambridge, Cambridge CB30FA, UK;

    Department of Mechanical and Process Engineering, ETH Zurich, Zurich CH-8092, Switzerland;

    Aixtron Ltd. Nanoinstruments, Swavesey, Cambridge CB244FQ, UK;

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