CHARACTERIZATION OF NF_3 CHAMBER CLEANS ON MULTIPLE CVD PLATFORMS

摘要

The use of NF_3 as a CVD chamber cleaning gas has grown rapidly in recent years. Thorough characterization of chamber clean exhaust using analytical instrumentation should be performed for each unique tool and film. Such data provides a clear picture of clean efficiency, seasoning effects, endpointing, and potential unwanted by-products, without which many aspects of process development and abatement selection may be left to guesswork. The following is the result of efforts to characterize three clean processes on two tool platforms, with an emphasis on endpoint optimization. The selection of endpoint criteria for each analytical instrument (including RGA, FTIR, and OES) is discussed. One oxide and two low-k films are examined, and particular attention is paid to global warming emissions from the latter.