Key Laboratory of Microelectronics Devices Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences, Bei-Tu-Cheng West Road No.3, Beijing, 10029, China;
Key Laboratory of Microelectronics Devices Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences, Bei-Tu-Cheng West Road No.3, Beijing, 10029, China;
Key Laboratory of Microelectronics Devices Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences, Bei-Tu-Cheng West Road No.3, Beijing, 10029, China;
Key Laboratory of Microelectronics Devices Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences, Bei-Tu-Cheng West Road No.3, Beijing, 10029, China;
Key Laboratory of Microelectronics Devices Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences, Bei-Tu-Cheng West Road No.3, Beijing, 10029, China;
Key Laboratory of Microelectronics Devices Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences, Bei-Tu-Cheng West Road No.3, Beijing, 10029, China;
Key Laboratory of Microelectronics Devices Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences, Bei-Tu-Cheng West Road No.3, Beijing, 10029, China;
Key Laboratory of Microelectronics Devices Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences, Bei-Tu-Cheng West Road No.3, Beijing, 10029, China;
机译:离子注入的TiN金属栅极具有双带边功函和出色的可靠性,适用于高级CMOS器件应用
机译:通过铝注入结合氟的高k /金属栅p-MOSFET来证明价带边有效功函数
机译:在铝结合氟的高k /金属栅极p-MOSFET中通过铝注入来证明价带边有效功函数
机译:高级MOSFET设备与双路有效频带边缘工作功能金属的集成使用HK和MG最后一个方案
机译:系统评估金属栅电极的有效功函数及其对CMOS器件性能的影响。
机译:拟议的双边沿触发静态D型触发器中的MOSFET沟道宽度和电源电压的多目标优化采用模糊非支配排序遗传算法II
机译:双金属双栅极高k堆叠(DMDG-HKS)MOSFET的模拟和RF性能评估