Chemical Characteristics of Negative-tone Chemically Amplified Resist For Advanced Mask Making

摘要

We investigated the film property and the lithographic performance of five commercialized NCARs. This report shows the relationship between chemical structure and EB lithographic performance, such as resolution, sensitivity and environmental stability. In this study, we found the good matching the matrix polymer, the cross linker and the photo acid generator(PAG) against NCARs issues. Furthermore, we could demonstrate the trade-off relation for lithographic factor and stabilized factor by chemical characteristics. This report suggests the strategy that was design of chemical structure for the next generation NCARs.