首页> 外文会议>Conference on Photomask and Next-Generation Lithography Mask Technology XI pt.1; 20040414-20040416; Yokohama; JP >The influence of spatio-temporal variation of temperature distribution in a polymer solution on a flat substrate on formation of polymer film's thickness distribution during drying process - based on results of simulation of the modified model
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The influence of spatio-temporal variation of temperature distribution in a polymer solution on a flat substrate on formation of polymer film's thickness distribution during drying process - based on results of simulation of the modified model

机译:基于改进模型的仿真结果,在干燥过程中,在平坦基板上的聚合物溶液中温度分布的时空变化对聚合物膜厚度分布的形成的影响

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摘要

We did many numerical simulation of the modified model of drying process for the flat polymer (resist) film fabrication taking effects of latent heat and heat conductivity into account and studied effects of introducing latent heat and heat conductivity to the model. From those we clarified dependence of distribution of resist molecules on a substrate on latent heat of solvent. Moreover, we clarified why above characteristic dependence of distribution of resist molecules on latent heat appeared.
机译:考虑到潜热和热导率的影响,我们对扁平聚合物(抗蚀剂)膜的干燥过程的改进模型进行了许多数值模拟,并研究了将潜热和热导率引入模型的影响。通过这些,我们阐明了抗蚀剂分子在基板上的分布对溶剂潜热的依赖性。此外,我们澄清了为什么会出现上述特征的抗蚀剂分子分布对潜热的依赖性。

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