200/300 mm Micrascan IV 248nm System for High Throughput Tight CD Control Applications

摘要

Micrascan (MS) IV is designed to provide superior Critical Dimension (CD) control & overlay performance at very high wafer throughputs for both 200 and 300mm wafers at low cost of ownership. This new system, targeted for sub-critical applications, includes SVGL's new flexible cross-performance platform & improved 0.6NA Catadioptric Projection Optics for better resolution and overlay. A new Laser Illumination System (LIS), capable of high doses at high throughput, uses a 2 kHz semi line narrowed KrF laser. SVGL has demonstrated its MS IV 248nm DUV optical design for successful insertion at the 180nm Lithography node. In this paper, modeled capabilities of SVGL's DUV optical design for both group and isolated lines will be presented. The performance potential with both conventional and enhanced illumination will be considered. Data from SVGL's Micrascan systems, illustrating Linewidth control, Depth Of Focus (DOF) performance for 180nm Group & Isolated features, and overlay performance potential will be given. The Cross performance platform with its high throughput capabilities will be discussed.