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Manufacture of large-scale mechanical devices in single-crystal silicon by high-speed grinding

机译:通过高速研磨在单晶硅中制造大型机械设备

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Abstract: Preliminary studies have been performed on small beams of silicon (1 $MUL 6 $MUL 40 mm) diamond machined by high speed milling/grinding. The effect of the grinding on the strength of these specimens has been assessed by masking a small portion of the surface and etching in a 1:9 solution of hydrofluoric and nitric acids for a set time. Removal of the mask reveals a step which is measured to determine the amount of material removed from the surface. These are then examined using x-ray diffractometry and the etch step surface finish measured using a Rank Taylor Hobson Form Talysurf stylus profilometer. Finally, the strength of the specimens is measured by loading the beams to failure in a small three point bend testing machine and monitoring the failure load. There is a slight increase in strength between the as-ground specimen and those where the surface has been etched by 1 - 2 $mu@m. Both x-ray and stylus measurements indicate the presence of a surface layer of thickness of the order one micrometer that is likely to be due to ductile mode grinding. It is also noted that there appears to be a local peak in strength after approximately 2 - 3 $mu@m has been etched from the surface. This is followed by a small reduction before steadily increasing to a maximum value of 425 MPa. It is speculated that this could be a result of a low defect zone around the tips of the cracks that are invariably propagated during the grinding process.!17
机译:摘要:已经对通过高速铣削/磨削加工的小直径硅晶片(1 $ MUL 6 $ MUL 40 mm)金刚石进行了初步研究。通过掩盖一小部分表面并在1:9的氢氟酸和硝酸溶液中蚀刻一定时间,可以评估研磨对这些样品强度的影响。去除掩模显示出被测量以确定从表面去除的材料量的步骤。然后使用X射线衍射仪检查这些,并使用Rank Taylor Hobson Form Talysurf测针轮廓仪测量蚀刻步骤的表面光洁度。最后,通过在小型三点弯曲试验机中将梁加载至破坏并监测破坏载荷来测量样品的强度。研磨后的试样与表面被腐蚀了1-2μm的试样之间的强度略有增加。 X射线和测针的测量值均表明存在可能是由于延性磨削造成的厚度约为1微米的表面层。还应注意的是,在从表面上刻蚀了大约2-3μm后,强度似乎出现了局部峰值。在稳步增加到最大值425 MPa之前,先进行少量减小。据推测,这可能是由于裂纹尖端周围的缺陷区域较低而导致的,这些缺陷区域在磨削过程中始终会扩散!17

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