Computational simulation of block copolymer directed self-assembly in small topographical guiding templates

摘要

Directed self-assembly (DSA) of block copolymers (BCP) has attracted significant interest due to its promising potential as the next generation lithography candidate. In this paper we used Self-Consistent-Field-Theory (SCFT) to computationally simulate the equilibrium behavior of self-assembly inside a confinement well, which is also known as graphoepitaxy. More specifically, we studied the DSA of cylinder-forming block copolymers for contact hole/via patterning, mainly focusing on 1-hole DSA pattern inside confinement well. The SCFT simulation results of parametric studies for confinement well sizes ranging from 50nm to 90nm, different polymer film thicknesses and a range of the wall/substrate affinity parameter values, are presented, as well as verified by experiments.