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Practical proof of CP element based design for 14nm node and beyond

机译:基于CP元素的14nm及更高节点设计的实践证明

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To realize HVM (High Volume Manufacturing) with CP (Character Projection) based EBDW, the shot count reduction is the essential key. All device circuits should be composed with predefined character parts and we call this methodology "CP element based design". In our previous work, we presented following three concepts . 1) Memory: We reported the prospects of affordability for the CP-stencil resource. 2) Logic cell: We adopted a multi-cell clustering approach in the physical synthesis. 3) Random interconnect: We proposed an ultra-regular layout scheme using fixed size wiring tiles containing repeated tracks and cutting points at the tile edges. In this paper, we will report the experimental proofs in these methodologies. In full chip layout, CP stencil resource management is critical key. From the MCC-POC (Proof of Concept) result , we assumed total available CP stencil resource as 9000um~2. We should manage to layout all circuit macros within this restriction. Especially the issues in assignment of CP-stencil resource for the memory macros are the most important as they consume considerable degree of resource because of the various line-ups such as 1RW-, 2RW-SRAMs, Resister Files and ROM which require several varieties of large size peripheral circuits. Furthermore the memory macros typically take large area of more than 40% of die area in the forefront logic LSI products so that the shot count increase impact is serious. To realize CP-stencil resource saving we had constructed automatic CP analyzing system. We developed two types of extraction mode of simple division by block and layout repeatability recognition. By properly controlling these models based upon each peripheral circuit characteristics, we could minimize the consumption of CP stencil resources. The estimation for 14nm technology node had been performed based on the analysis of practical memory compiler. The required resource for memory macro is proved to be affordable value which is 60% of full CP stencil resource and wafer level converted shot count is proved to be the level which meets 100WPH throughput. In logic cell design, circuit performance verification result after the cell clustering has been estimated. The cell clustering by the acknowledgment of physical distance proved to owe large penalty mainly in the wiring length. To reduce this design penalty, we proposed CP cell clustering by the acknowledgment of logical distance. For shot-count reduction of random interconnect area design, we proposed a more structural routing architecture which consists of the track exchange and the via position arrangement. Putting these design approaches together, we can design CP stencils to hit the target throughput within the area constraint. From the analysis for other macros such as analog, I/O, and DUMMY, it has proved that we don't need special CP design approach than legacy pattern matching CP extraction. From all these experimental results we get good prospects to the reality of full CP element based layout.
机译:为了实现基于CP(字符投影)的EBDW的HVM(大批量生产),减少镜头数量是必不可少的关键。所有器件电路都应由预定义的字符部分组成,我们将此方法称为“基于CP元素的设计”。在我们以前的工作中,我们提出了以下三个概念。 1)记忆力:我们报告了CP模板资源的可承受性前景。 2)逻辑单元:我们在物理综合中采用了多单元集群方法。 3)随机互连:我们提出了一种超规则布局方案,该方案使用固定大小的接线砖,在砖边缘包含重复的轨迹和切割点。在本文中,我们将报告采用这些方法的实验证明。在完整的芯片布局中,CP模板资源管理至关重要。根据MCC-POC(概念验证)结果,我们假定CP模板总可用资源为9000um〜2。我们应该设法在此限制内布置所有电路宏。尤其是,为内存宏分配CP模具资源的问题是最重要的,因为它们占用大量资源,因为1RW-,2RW-SRAM,Resister文件和ROM等各种阵容需要多种类型的内存。大型外围电路。此外,在最前沿的逻辑LSI产品中,存储器宏通常占用占芯片面积40%以上的大面积,因此镜头数量增加的影响是严重的。为了实现CP模板资源的节省,我们构建了自动CP分析系统。我们开发了两种简单的按块划分和布局可重复性识别的提取模式。通过基于每个外围电路特性适当地控制这些模型,我们可以最大程度地减少CP模板资源的消耗。基于对实际存储器编译器的分析,对14nm技术节点进行了估算。存储器宏所需的资源被证明是负担得起的价值,占CP模板全部资源的60%,晶圆级转换的射出数量被证明是满足100WPH吞吐量的级别。在逻辑单元设计中,估计了单元群集后的电路性能验证结果。物理距离的确认导致的单元簇被证明主要在布线长度上具有较大的损失。为了减少这种设计代价,我们提出了通过逻辑距离的确认来进行CP信元聚类。为了减少随机互连区域设计的镜头数量,我们提出了一种更具结构性的布线架构,该架构由轨迹交换和通孔位置安排组成。将这些设计方法放在一起,我们可以设计CP模板以达到面积约束内的目标吞吐量。通过对其他宏(例如模拟,I / O和DUMMY)的分析,证明除了传统模式匹配CP提取之外,我们不需要特殊的CP设计方法。从所有这些实验结果中,我们可以为基于CP元素的完整版图的实际应用提供良好的前景。

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