IMEC, Kapeldreef 75, B-3001 Leuven, Belgium,Katholieke Universiteit Leuven, Department of Electrical Engineering (ESAT), Kasteelpark Arenberg 10, B-3001, Leuven, Belgium;
ASM, Kapeldreef 75, B-3001 Leuven;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium,Intel Corporation, 2200 Mission College Blvd, Santa Clara, CA 95054, USA;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium,Katholieke Universiteit Leuven, Department of Chemistry, Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
ASM, Kapeldreef 75, B-3001 Leuven;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
SIS; sequential infiltration synthesis; synthesis in situ; DSA; directed self-assembly; LER; LWR; metallic mask;
机译:原子力显微镜评估正电子束抗蚀剂图案的顺序渗透合成和溶剂退火诱导的形态变化
机译:通过原子力显微镜评估的正音电子束抗蚀剂图中的顺序浸润合成 - 和溶剂退火诱导的形态变化
机译:顺序渗透合成光刻技术可实现基材的高比例配图
机译:顺序渗透综合对DSA线路模式保真的影响
机译:利用时间顺序滑坡图像对南加州南部沙滩粉末的脱水影响
机译:快速合成纳米多孔保形涂料等离子增强聚合物模板的顺序渗透
机译:RPS15突变慢性淋巴细胞白血病的全局蛋白质合成和平移保真品的改变模式