Research Development management headquarters, Electronic Materials Research Laboratories, FUJIFILM Corporation Kawashiri 4000, Yoshida-cho, Haibara-gun, Shizuoka, 421-0396, Japan;
Research Development management headquarters, Electronic Materials Research Laboratories, FUJIFILM Corporation Kawashiri 4000, Yoshida-cho, Haibara-gun, Shizuoka, 421-0396, Japan;
Research Development management headquarters, Electronic Materials Research Laboratories, FUJIFILM Corporation Kawashiri 4000, Yoshida-cho, Haibara-gun, Shizuoka, 421-0396, Japan;
Research Development management headquarters, Electronic Materials Research Laboratories, FUJIFILM Corporation Kawashiri 4000, Yoshida-cho, Haibara-gun, Shizuoka, 421-0396, Japan;
Research Development management headquarters, Electronic Materials Research Laboratories, FUJIFILM Corporation Kawashiri 4000, Yoshida-cho, Haibara-gun, Shizuoka, 421-0396, Japan;
negative tone development; cost effective process; KrF-NTD resist; litho-litho-etch process;
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