JSR Micro INC, 1280 N. Mathilda Ave, Sunnyvale, CA 94089, USA;
Molecular Foundry, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720;
Molecular Foundry, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720;
Center for X-ray Optics, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720;
Molecular Foundry, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720;
Molecular Foundry, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720;
Peak Force Tapping; Modulus; E-beam pattern; AFM; pattern collapse; chemically amplified; bias; high resolution;
机译:单层表面接枝PMMA作为负色调电子束抗蚀剂
机译:基于杯芳烃的EUV光刻新的负性分子抗蚀剂的开发
机译:用于EUV和EB光刻的负音分子抗蚀剂的表征
机译:利用负色调EUV / E型梁中的模量映射揭示光束诱导的化学,抗蚀剂,无且没有交联剂添加剂
机译:通过结合和修改有或没有添加剂的表面化学参数,可以优化高浓度碳质固体水浆料的粘度。
机译:CsaR 62作为高对比度电子束光刻的负色调抗蚀剂 温度在4 K和室温之间