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Subsurface Structures of Monocrystalline Silicon Generated by Nanogrinding

机译:纳米研磨产生的单晶硅的表面结构

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This paper reports the effect of nanogrinding conditions on the formation of subsurface structures of monocrystalline silicon (100) substrates. It was found that the amorphization and the transformation of high pressure phases were related to the grit depth of cut employed in nanogrinding. The formation mechanisms were found to be different from those previously reported from the nanoindentation studies.
机译:本文报道了纳米研磨条件对单晶硅(100)衬底表面结构形成的影响。结果发现,高压相的非晶化和相变与纳米研磨中切屑的深度有关。发现其形成机理与先前从纳米压痕研究中报道的那些不同。

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