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Electroluminescent Characteristics of ZnS Films Grown by CVD with Pulsed Laser Ablation Impurity Doping

机译:脉冲激光烧蚀杂质掺杂CVD法生长的ZnS薄膜的电致发光特性

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摘要

The ZnS:Mn films were prepared by the low pressure thermal chemical vapor deposition with doping of impurity Mn by the pulsed YAG laser ablation of metal Mn target in the deposition chamber. The Mn was successfully doped into the growing ZnS films by this method. The Crystallinity of the films were generally poor, however, the electroluminescent characteristics were almost same as those of good crystalline films hitherto reported.
机译:通过在沉积室中通过脉冲YAG激光烧蚀金属Mn靶材,通过掺杂杂质Mn的低压热化学气相沉积法制备ZnS:Mn膜。通过这种方法将锰成功地掺杂到生长的ZnS薄膜中。膜的结晶度通常较差,但是,电致发光特性与迄今报道的良好结晶膜几乎相同。

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