Particle removal efficiency evaluation of filters in high temperature IPA

摘要

The need of isopropyl alcohol (IPA) for wafer drying has been increasing in the semiconductor industry, because the structure of semiconductor devices is getting more complicated and IPA drying is more preferable to avoid pattern disruption of complicated device structure. Also, as the feature size of the semiconductor devices continuously decreasing, the cleanliness level of IPA needs to be further improved. Filtration is an indispensable technology to control the cleanliness, and more and more filters with finer removal rating are now being used to achieve the required cleanliness level.