首页> 外文会议>2017 29th International Symposium on Power Semiconductor Devices and IC's >Investigation of current collapse mechanism of LPCVD Si3N4 passivated AlGaN/GaN HEMTs by fast soft-switched current-DLTS and CC-DLTFS
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Investigation of current collapse mechanism of LPCVD Si3N4 passivated AlGaN/GaN HEMTs by fast soft-switched current-DLTS and CC-DLTFS

机译:快速软开关电流-DLTS和CC-DLTFS研究LPCVD Si3N4钝化的AlGaN / GaN HEMT的电流崩塌机理

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摘要

In this work, we investigated the current collapse mechanism of AlGaN/GaN high-electron mobility transistors (HEMTs) with LPCVD SiN passivation. With newly developed fast soft-switched current-DLTS techniques, we achieved current acquisition within 100 ns after each stress pulse and with high sampling rate up to 5 MSa/s. A single trap level (~66 meV) and capture cross section On (-1.05×10 cm) has been found within the AlGaN/GaN HEMTs surface. Moreover, this trap level is confirmed by low-temperature Constant-Capacitance Deep-Level Transient Fourier Spectroscopy (CC-DLTFS) measurement on GaN MIS-diode structure. Although this trap level is quite shallow, it can still lead to current collapse in LPCVD-SiNx-passivated AlGaN/GaN HEMTs due to the small On.
机译:在这项工作中,我们研究了具有LPCVD SiN钝化的AlGaN / GaN高电子迁移率晶体管(HEMT)的电流崩塌机理。借助最新开发的快速软开关电流-DLTS技术,我们在每个应力脉冲后的100 ns内实现了电流采集,并且采样率高达5 MSa / s。在AlGaN / GaN HEMT表面发现了单个陷阱能级(〜66 meV)和捕获截面On(-1.05×10 cm)。此外,该陷阱能级通过对GaN MIS二极管结构进行低温恒电容深能级瞬态傅里叶光谱(CC-DLTFS)测量得到确认。尽管该陷阱能级很浅,但由于导通电阻小,它仍可能导致LPCVD-SiNx钝化的AlGaN / GaN HEMT中的电流崩溃。

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