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Strain profile, electronic band structure and optical gain of self-assembled Ge quantum dots on SiGe virtual substrate

机译:SiGe虚拟衬底上自组装Ge量子点的应变曲线,电子能带结构和光学增益

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摘要

Group IV (Si, Ge, Sn) alloys are promising materials for future optoelectronic devices. Their compatibility with Si technology would allow us to engineer novel growth techniques and bandgap engineering methods to obtain direct band gap materials [1]. Other alloy compositions could allow wider wavelength range [2] which can revolutionize the photonics industry - leading to new design of LEDs, photodetectors, laser diodes and electro optical modulators.
机译:第四族(Si,Ge,Sn)合金是用于未来光电器件的有前途的材料。它们与硅技术的兼容性将使我们能够设计出新颖的生长技术和带隙工程方法来获得直接的带隙材料[1]。其他合金成分可以允许更宽的波长范围[2],这可以彻底改变光子学行业-导致LED,光电探测器,激光二极管和电光调制器的新设计。

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