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Strained Ge0.96Sn0.04 P-channel MOSFETs with in situ low temperature Si2H6 surface passivation

机译:原位低温Si 2 H 6 表面钝化的应变Ge 0.96 Sn 0.04 P沟道MOSFET

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摘要

We developed process flow for GeSn pMOSFET fabrication with in situ low temperature Si2H6 passivation module. High performance Ge0.96Sn0.04 pMOSFETs were fabricated. At a Qmv of 6×1012 cm−2, a 24% enhancement in μeff is demonstrated in Ge0.96Sn0.04 pMOSFETs compared to Ge control.
机译:我们使用原位低温Si2H6钝化模块开发了用于GeSn pMOSFET制造的工艺流程。制作了高性能的Ge0.96Sn0.04 pMOSFET。与Ge控件相比,在Ge0.96Sn0.04 pMOSFET中,在6×1012 cm-2的Qmv下,μeff的提高了24%。

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