CMOS-fabricated tensile Ge microstructures: towards an edge-emitting laser

摘要

The realization of a Si-integrated light source represents today the “Holy Grail” of silicon photonics. An approach based on slightly tensile strained (εtherm∼2.5×10−3) Ge/Si heterostructures has led to the demonstration of both optically [1] and electrically [2] pumped laser. This achievement has been welcomed by the scientific community as a leap toward a monolithically integrated silicon-based photonic platform.