首页> 外文会议>2012 7th International Microsystems, Packaging, Assembly and Circuits Technology Conference. >Electroplating through holes with different geometry -- A novel and high productivity process for through hole fill plating
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Electroplating through holes with different geometry -- A novel and high productivity process for through hole fill plating

机译:电镀不同几何形状的通孔-一种新颖且高生产率的通孔填充电镀工艺

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摘要

A novel DC through hole filling process was formulated for high volume HDI and substrate core layer metallization production. The process yields high quality results over a wide current density range.
机译:制定了一种新颖的DC通孔填充工艺,用于大批量HDI和基板芯层金属化生产。该方法可在较宽的电流密度范围内产生高质量的结果。

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