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The effect of surface morphology to photoluminescence spectrum porous silicon

机译:表面形态对光致发光光谱多孔硅的影响

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The porous silicon nanostructures was prepared by electrochemical etching of p-type silicon wafer. Porous silicon structure has good mechanical robustness, chemical stability, and compatibility with existing silicon technology. Therefore, it also has a wide area of potential applications such as waveguides, 1D photonic crystals, chemical sensors, biological sensor etc. Photoluminescences characteristics of porous silicon depend on their morphology because the size and distribution of pore its self will effect to their exciton energy level. The structure of porous silicon controlled by the parameters used during the experiment which know as experimental factor. These factors such as etching time, current density applied, temperature, doping concentration etc play an important role during the formation of porous. It will effect either to the thickness or porosity of sample. In this work, we select one of that factor to corellate which optical properties of porous silicon. We investigated the surface morphology by using Atomic Force Microscope (AFM) and photoluminescences using Photoluminescences (PL) spectrometer.
机译:通过对p型硅晶片进行电化学蚀刻来制备多孔硅纳米结构。多孔硅结构具有良好的机械强度,化学稳定性以及与现有硅技术的兼容性。因此,它还具有广泛的潜在应用领域,例如波导,一维光子晶体,化学传感器,生物传感器等。多孔硅的光致发光特性取决于其形态,因为其自身的孔的大小和分布会影响其激子能量。水平。多孔硅的结构受实验中使用的参数(称为实验因子)的控制。这些因素,例如蚀刻时间,所施加的电流密度,温度,掺杂浓度等在多孔形成过程中起着重要的作用。它会影响样品的厚度或孔隙率。在这项工作中,我们选择一个因素来确定多孔硅的光学特性。我们通过使用原子力显微镜(AFM)和使用光致发光(PL)光谱仪的光致发光来研究表面形态。

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