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Reproducibility of Silicon Single Electron Quantum Dot Transistor

机译:硅单电子量子点晶体管的重现性

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摘要

In principle, based on the form of tunnel junction, single electron transistor (SET) can be classified into four types, i.e. nanowire SET, quantum dot SET, nanotube SET and point contact SET. Another classification is SET based on the kind of conducting material between gate and island, which consists of resistive-SET and capacitive SET. There are about 18 types of SET designs have previously published by many researchers. This paper describes each SET design of 18 all in the reproducibly design point of view at most the form of source-drain contact junction, layers structure, and the modification of fabrication technology. The reproducibility of single electron transistor can be observed from the equity of design, dimension and device characteristics. Indeed, the forms of SET source-drain contact junction have very large influences on the difficulties level of fabrication processes and electrical characteristics.
机译:原则上,基于隧道结的形式,单电子晶体管(SET)可以分为四种类型,即纳米线SET,量子点SET,纳米管SET和点接触SET。根据栅极和岛之间的导电材料的种类,另一种分类是SET,它由电阻性SET和电容性SET组成。许多研究人员先前已经发表过大约18种SET设计。本文从可再现的设计观点出发,最多描述了18种SET的每个SET设计,包括源极-漏极接触结的形式,层结构以及制造技术的改进。从设计,尺寸和器件特性的平等性可以观察到单电子晶体管的可重复性。实际上,SET源极-漏极接触结的形式对制造工艺的困难程度和电特性具有很大的影响。

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