Novel PDMS/epoxy stamp for imprint lithography

摘要

Polyurethaneacrylate (PUA) stamp has been used for the pattern formation on the dielectric layer, but the transferred patterns have some defects due to the high modulus of the stamp. To overcome these problems, polydimethylsioxane (PDMS) stamp was used as an alternative whose modulus was controlled by the epoxy contents. The PDMS stamp was fabricated from 4"silicon master with no defect, and was used for the pattern formation on the dielectric layer. The patterns on the dielectric layer were checked with scanning electron microscope (SEM), and confocal microscope, and there was no defect on the layer.