首页> 外文会议>Nano Science and Technology Institute(NSTI) Nanotechnology Conference and Trade Show(NSTI Nanotech 2006) vol.3 >A computationally efficient method for analytical calculation of potentials in undoped symmetric DG SOI MOSFET
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A computationally efficient method for analytical calculation of potentials in undoped symmetric DG SOI MOSFET

机译:一种计算有效的方法,用于分析未掺杂的对称DG SOI MOSFET中的电势

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摘要

In order to build an analytical model of an undoped symmetric DG SOI MOSFET devices, an accurate but rather difficult method was used by S. Malobabic et.al. In that paper, the authors have used a complicated Lambert function for the potential calculation and smoothing parameters without physical meaning. Starting from their model, the purpose of this paper is to show an original, simple and efficient analytical method for the computation of electrostatic potentials of the silicon film of such MOSFET novel device as a function of the gate to source voltage. Then, the total channel carrier charge will be computed from the silicon surface potential solution. Results from our proposed model will be compared to those obtained in the literature.
机译:为了建立未掺杂的对称DG SOI MOSFET器件的分析模型,S。Malobabic等人使用了一种准确但相当困难的方法。在那篇论文中,作者使用了复杂的Lambert函数进行电势计算和平滑参数,而没有物理意义。从他们的模型开始,本文的目的是展示一种新颖,简单而有效的分析方法,用于计算这种MOSFET新器件的硅膜静电势随栅极至源极电压的变化。然后,将从硅表面电势溶液中计算出总的沟道载流子电荷。我们提出的模型的结果将与文献中的结果进行比较。

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