首页> 外文会议>International meeting on information display;International display manufacturing conference and Asia display;IMID/IDMC/Asia Display 2010 >Annealing Effects on the Transparent Zinc Tin Oxide Thin Film Transistor and Circuit Applications
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Annealing Effects on the Transparent Zinc Tin Oxide Thin Film Transistor and Circuit Applications

机译:退火对透明氧化锌锡薄膜晶体管及其电路应用的影响

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We report about the annealing effects on the characteristics of Zinc Tin Oxide (ZTO) thin film transistors (TFTs) and the circuit applications. To improve the properties of devices, we annealed the devices using various sequences. Here, we could improve the characteristics of ZTO TFTs and inverters using these simple and adequate annealing processes. When we annealed the device after source/drain electrode deposition, the subthreshold swing was improved and threshold voltage shifted to the positive direction compared with the device annealed before electrode deposition. So we could control the properties of devices by simple annealing process and enhance the static characteristics of inverter devices.
机译:我们报告了退火对氧化锌锡(ZTO)薄膜晶体管(TFT)的特性以及电路应用的影响。为了改善设备的性能,我们使用各种顺序对设备进行了退火。在这里,我们可以使用这些简单而适当的退火工艺来改善ZTO TFT和反相器的特性。当我们在源/漏电极沉积之后对器件进行退火时,与在电极沉积之前进行退火的器件相比,亚阈值摆幅得到了改善,并且阈值电压向正方向移动。因此,我们可以通过简单的退火工艺来控制器件的性能,并增强逆变器器件的静态特性。

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