MARK TO BE PROJECTED ON AN OBJECT DURIGN A LITHOGRAHPIC PROCESS AND METHOD FOR DESIGNING A MARK

摘要

The first layer mark and the second layer mark are adapted to be projected onto each other during the lithographic process. The first layer components and the second layer components are adapted to be arranged in a plurality of different overlay configurations, each overlay configuration comprising a number of the plurality of the first layer components and a number of the plurality of the second layer components, and each overlay configuration having a different overlay distance at which each first layer component is arranged in a first direction of an associated second layer component of the second layer components. The method comprises determining an overlay step which represents a difference between the different overlay distances of the plurality of overlay configurations, determining a largest overlay distance, determining the number of first layer components and/or the number of associated second layer components in each overlay configuration.