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TARGET AND ALGORITHM TO MEASURE OVERLAY BY MODELING BACK SCATTERING ELECTRONS ON OVERLAPPING STRUCTURES
TARGET AND ALGORITHM TO MEASURE OVERLAY BY MODELING BACK SCATTERING ELECTRONS ON OVERLAPPING STRUCTURES
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机译:通过在重叠结构上建模散射电子来测量叠加的目标和算法
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摘要
An overlay target includes a grating-over-grating structure with a bottom grating structure disposed on a specimen and a top grating structure disposed on the bottom grating structure. The overlay target further includes a calibration scan location including the bottom grating structure but not the top grating structure and an overlay scan location including the top grating structure and the bottom grating structure.
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