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CYCLIC SPIKE ANNEAL CHEMICAL EXPOSURE FOR LOW THERMAL BUDGET PROCESSING
CYCLIC SPIKE ANNEAL CHEMICAL EXPOSURE FOR LOW THERMAL BUDGET PROCESSING
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机译:低热预算加工的循环尖峰退火化学曝光
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摘要
Apparatus and methods are provided for sequential deposition and annealing of films in a single processing chamber. An energy source positioned within the processing chamber in a region isolated from process gases rapidly forms and decomposes (films) on the substrate without damaging underlying layers by exceeding the thermal budget of the device being formed. decompose) can be used to
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