METHOD OF DETECTING AN ARC OCCURRING DURING THE POWER SUPPLY OF A PLASMA PROCESS CONTROL UNIT FOR A PLASMA POWER SUPPLY AND PLASMA POWER SUPPLY

摘要

A plasma power supply 10 for supplying power to a plasma process in the plasma chamber 30 comprises: a. DC source 15; b. an output signal generator 16 coupled to a DC source 15; c. a first signal sequence measuring device (20) for measuring a signal sequence present between the DC source (15) and the output signal generator (16); d. a second signal sequence measuring device (18, 19) for measuring a signal sequence present at the output of the output signal generator (16); and e. and a control unit 14 connected to the first and second signal sequence measuring devices 18 , 19 , 20 .