DETERMINATION METHOD AND APPARATUS, PROGRAM, INFORMATION RECORDING MEDIUM, EXPOSURE APPARATUS, LAYOUT INFORMATION PROVIDING METHOD, LAYOUT METHOD, MARK DETECTION METHOD, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

摘要

A determination apparatus has a calculation section, where first and second direction pitches intersecting within a predetermined plane of a plurality of detection areas are D1 and D2, respectively, sizes in the first and second directions of each of a plurality of divided areas arranged two-dimensionally along the first and second directions on a substrate are W1 and W2, respectively, and first and second direction pitches of a plurality of marks arranged on the substrate are p1 and p2, respectively, calculates pitch p1 and pitch p2 of the plurality of marks that satisfy formulas (a) and (b) below, based on pitch D1, pitch D2, size W1, and size W2.; p 1 =D 1 /i (i denotes a natural number)=W1/m (m denotes a natural number)   (a); p 2 =D 2 /j (j denotes a natural number)=W2/n (n denotes a natural number)   (b)