首页> 外国专利> Scanning strategy for minimizing charging effects and radiation damage in charged particle beam measurement systems

Scanning strategy for minimizing charging effects and radiation damage in charged particle beam measurement systems

机译:扫描策略,以最大限度地减少带电粒子束测量系统中的充电效应和辐射损伤

摘要

An apparatus and method for performing overlay measurements on a target having at least two layers formed thereon are disclosed.A target having a plurality of periodic structures is provided for measuring overlay at least two overlay directions.The charged particle beam is scanned in the first direction by the first tilt with respect to the target by a plurality of scan swings of the target, and as a result, each edge of the periodic structure is slanted.The charged particle beam is from a plurality of scanning swans to the first tilt ° In the second tilt which is opposite to the first direction is scanned.Next, the scanning operation in the first and second directions is repeated with different first and second tilts and with a plurality of scan SWS different in the target, so that the target is scanned symmetrically.An overlay error of the target is determined and reported based on the synthesized image formed by combining the image generated by the scanning operation in the first and second directions to form a composite image.
机译:公开了一种用于在其上形成至少两层的目标上执行覆盖测量的装置和方法。提供具有多个周期性结构的靶,用于测量覆盖物至少两个覆盖方向。在第一方向上扫描带电的粒子束通过第一次倾斜通过目标的多个扫描摆动,因此,周期性结构的每个边缘被倾斜。带电的粒子束来自多个扫描天鹅到第一倾斜°扫描与第一方向相反的第二倾斜。将第一和第二方向上的扫描操作用不同的第一和第二倾斜重复,并且在目标中不同的扫描SWS,从而扫描目标对称。基于通过组合第一A中的扫描操作产生的图像来确定并报告目标的覆盖错误D第二方向形成合成图像。

著录项

  • 公开/公告号JP2021515232A

    专利类型

  • 公开/公告日2021-06-17

    原文格式PDF

  • 申请/专利权人 ケーエルエー コーポレイション;

    申请/专利号JP20200546371

  • 发明设计人 シャオ ホン;

    申请日2019-03-05

  • 分类号G01B15;H01J37/147;H01J37/22;H01J37/20;H01L21/66;G03F9;

  • 国家 JP

  • 入库时间 2022-08-24 19:25:35

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