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Integrated circuits and processes for protection of standard cell performance from context effects

机译:从上下文效应保护标准单元性能的集成电路和过程

摘要

Integrated circuit (5) includes substrate (10) with surface (20) and structure (30) including base levels (45.i, 45.(i+1)), terminating cells (48, 49), and block (40) of standard cells arranged in rows (42.i, 42.(i+1)), and another type of block (60) outside block (40). Standard cells at at least two edges of block (40) have the following protections: (1) block (60) has strip of separation (41.j) having at least a minimum width from the edges of block (40), and protected by one of the following: (2) terminating cells (48, 49) reduce context effect and some terminating cells (48) are placed at at least one end of rows (42.i, 42.(i+1)) of standard cells within first-named block (40), and (3) the terminating cells (48, 49) reduce context effect and some terminating cells (49) are at one end of a column of standard cells within block (40). Other structures, devices, and processes are also disclosed.
机译:集成电路( 5 )包括具有表面( 20 )的底物( 10 )和包括碱基的结构( 30 )级别( 45。 i, 45 。( i +1)),终止单元格( 48 ,49 ),并块( 40 )以行排列( 42. i, 42 < /b>(“我”),以及另一类块( 60 )外部块( 40 )。块( 40 )具有分离条( 41。 j )具有来自块边缘的最小宽度( 40 ),并受以下之一保护:(2)终止单元( 48,49 )减少上下文效果,并且一些终止细胞( 48 )放置在行的至少一端( 42. i,< /i> / 1/1)(“我”)在第一命名块( 40 )内的标准单元,( 3 )终止细胞( 48,49 )减少上下文效应,并且一些终止细胞( 49 )位于块内的标准单元列的一端( 40 )。还公开了其他结构,装置和过程。

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