首页> 外国专利> ELECTROLESS NICKEL ALLOY PLATING BATHS, A METHOD FOR DEPOSITION OF NICKEL ALLOYS, NICKEL ALLOY DEPOSITS AND USES OF SUCH FORMED NICKEL ALLOY DEPOSITS

ELECTROLESS NICKEL ALLOY PLATING BATHS, A METHOD FOR DEPOSITION OF NICKEL ALLOYS, NICKEL ALLOY DEPOSITS AND USES OF SUCH FORMED NICKEL ALLOY DEPOSITS

机译:化学镍合金电镀浴,一种沉积镍合金的方法,镍合金沉积物和这种形成的镍合金沉积物的用途

摘要

The present invention relates to an electroless nickel alloy plating bath comprising nickel ions; further reducible metal ions selected from the group consisting of molybdenum ions, rhenium ions, tungsten ions, copper ions, oxo-ions thereof, and mixtures thereof; at least one reducing agent suitable to reduce the nickel ions and the further reducible metal ions to their respective metallic state; complexing agents CA1, CA2, CA3, and CA4, wherein CA1, CA2, CA3, and CA4 are all different from each other, wherein each of CA1 and CA2 is independently selected from the group consisting of compounds having at least two carboxylic acid moieties, the respective salts thereof as well as mixtures of the aforementioned; wherein CA3 is selected from the group consisting of aliphatic compounds having exactly one carboxylic acid moiety, the respective salts thereof as well as mixtures of the aforementioned; and wherein CA4 is selected from the group consisting of aromatic compounds having at least one carboxylic acid moiety, the respective salts thereof as well as mixtures of the aforementioned.
机译:包含镍离子的化学镀镍合金电镀浴技术领域本发明涉及包含镍离子的无电镍合金电镀浴;从钼离子,铼离子,钨离子,铜离子,氧代离子及其混合物中选择的进一步还原金属离子。至少一种用于将镍离子和另外的可再冻结金属离子还原成其各自的金属状态的还原剂;络合剂Ca1,Ca2,Ca 3和Ca4,其中Ca1,Ca2,Ca 3和Ca4彼此不同,其中Ca1和Ca2中的每一种独立地选自具有至少两个羧酸部分的化合物,其各自的盐以及上述的混合物;其中Ca 3选自具有恰好一个羧酸部分的脂族化合物,其各自的盐以及上述的混合物;并且其中Ca 4选自具有至少一种羧酸部分的芳族化合物,其各自的盐以及上述的混合物。

著录项

  • 公开/公告号WO2021099475A1

    专利类型

  • 公开/公告日2021-05-27

    原文格式PDF

  • 申请/专利权人 ATOTECH DEUTSCHLAND GMBH;

    申请/专利号WO2020EP82699

  • 发明设计人 LANG SEBASTIAN;

    申请日2020-11-19

  • 分类号C23C18/50;

  • 国家 EP

  • 入库时间 2022-08-24 19:01:51

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