首页> 外国专利> Method for measuring plating treatment time of electroless plating liquid, sample preparation method for preparing sample for evaluating electroless plating liquid, and evaluation method of electroless plating liquid

Method for measuring plating treatment time of electroless plating liquid, sample preparation method for preparing sample for evaluating electroless plating liquid, and evaluation method of electroless plating liquid

机译:化学镀液电镀处理时间的方法,用于评价化学镀液样品的样品制备方法,以及无电镀液的评价方法

摘要

PROBLEM TO BE SOLVED: To provide a technique for measuring a time required for plating when throwing powder into an electroless plating solution to perform electroless plating.SOLUTION: The method for measuring a plating time when plating powder in an electroless plating solution comprises: the mixing step of mixing the electroless plating solution including first metal ions with the powder; the sample preparing step of sampling a predetermined amount from the electroless plating solution and separating the powder to repeatedly prepare a sample including the first metal ions at intervals of a predetermined time; the quantification step of quantifying the concentration of the first metal ions included in each sample repeatedly prepared at the intervals of the predetermined time; and the measurement step of measuring the plating time in the electroless plating solution on the basis of the result of the quantification step.SELECTED DRAWING: None
机译:要解决的问题:提供一种用于测量在粉末投掷到化学镀液中时电镀所需的时间,以进行化学镀液化。溶液:用于测量电镀液中电镀粉末的电镀时间的方法包括:混合将包含第一金属离子的化学镀溶液混合的步骤;样品制备从化学镀液溶液采样预定量并将粉末分离以重复制备包括第一金属离子的样品的预定时间的预定量;量化包括在预定时间的间隔中的每个样品中包含的第一金属离子的浓度的定量步骤;和在化学镀液中测量电镀液中的电镀时间的测量步骤,基于定量步骤的结果。选择图:无

著录项

  • 公开/公告号JP6863170B2

    专利类型

  • 公开/公告日2021-04-21

    原文格式PDF

  • 申请/专利权人 住友金属鉱山株式会社;

    申请/专利号JP20170157913

  • 发明设计人 冨士田 公彦;

    申请日2017-08-18

  • 分类号C23C18/31;G01N21/73;

  • 国家 JP

  • 入库时间 2022-08-24 18:17:58

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