Thin film deposition method through controlled formation of vapor phase transition species

摘要

A method of depositing a thin film on a substrate is provided. The method includes providing a source precursor comprising one or more elements constituting a thin film, generating a transition species from the source precursor, and depositing a thin film from the transition species on a substrate. Transition species are reactive intermediates that have a limited lifetime in the condensed phase at room temperature or above room temperature.