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Measurement of thin contamination layers on materials - is by determination of ratio of intensities from k and l shells in X:ray fluorescent radiation spectra

机译:测量材料上薄的污染层-通过确定X:射线荧光辐射光谱中k和l壳的强度比来确定

摘要

The surface to be examined is irradiated by X-rays and fluorescence radiation generated as a result is measured by formation of ratios of intensities of K and L radiation from the excited elements. The contamination layer and coating thickness are determined from these ratios. The device carrying out this procedure consists of a radioactive radiation source or an electron X-ray source (2), a specimen holder (3) and an energy dispersive detector (4). They are mounted in a vessel which can be evacuated, with energy discriminator (5) and electronic computer connected to it.
机译:用X射线照射被检查表面,并通过形成来自被激发元素的K和L辐射的强度比来测量所产生的荧光辐射。由这些比率确定污染层和涂层厚度。进行此过程的设备由放射性辐射源或电子X射线源(2),样品架(3)和能量色散检测器(4)组成。它们安装在可以抽空的容器中,并带有能量识别器(5)和电子计算机。

著录项

  • 公开/公告号DE2549735A1

    专利类型

  • 公开/公告日1977-11-03

    原文格式PDF

  • 申请/专利权人 DR.G. F. PAUL MUELLER INGENIEUR-BUERO;

    申请/专利号DE19752549735

  • 发明设计人 MUELLERPAULDIPL.-PHYS.DR.;

    申请日1975-11-06

  • 分类号G01B15/02;G01N23/223;

  • 国家 DE

  • 入库时间 2022-08-23 00:03:49

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