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MOSFET combining integrated circuit - has substrate of given specific resistance and impurity zones for MOSFETs of concentration and depletion type

机译:结合集成电路的MOSFET-具有给定电阻率的衬底和用于浓度和耗尽型MOSFET的杂质区

摘要

An integrated circuit consists of a combination of a MOSFET for concentrated operation and a MOSFET for depleted operation. The depleted and concentrated FETs are next to each other and are connected such that the depleted FET acts as a load for the concentrated FET in an inverted stage. They are both made in a common substrate with only two implantations. The substrate (20) of one type of conductivity has a specific resistance of approximately 10 Ohm. cm. There is a zone (25) with increased impurity concentration of the same type of conductivity in the area of the gate electrode (32) of the concentrated FET. There is a second zone (13) of reduced impurity concentration below the first zone. There is also a third zone (30a) of the opposite type conductivity below the gate electrode of the second FET.
机译:集成电路由用于集中工作的MOSFET和用于耗尽工作的MOSFET的组合组成。耗尽型和集中式FET彼此相邻并连接,以使耗尽型FET在反相时充当集中式FET的负载。它们都在只有两个注入的共同衬底中制成。一种导电类型的衬底(20)具有大约10欧姆的电阻率。厘米。在集中FET的栅电极(32)的区域中存在具有相同导电类型的杂质浓度增加的区域(25)。在第一区域下方具有降低了杂质浓度的第二区域(13)。在第二FET的栅电极下方还存在具有相反类型导电性的第三区域(30a)。

著录项

  • 公开/公告号DE2813566A1

    专利类型

  • 公开/公告日1978-10-05

    原文格式PDF

  • 申请/专利权人 NATIONAL SEMICONDUCTOR CORP.;

    申请/专利号DE19782813566

  • 发明设计人 KLEINTHOMAS;

    申请日1978-03-29

  • 分类号H01L27/04;H01L29/78;

  • 国家 DE

  • 入库时间 2022-08-22 21:53:32

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