首页> 外国专利> Arrangement with a atom - or. Molecular radiation source according to the principle of atomization solid materials

Arrangement with a atom - or. Molecular radiation source according to the principle of atomization solid materials

机译:与原子排列-或。根据固体材料雾化原理的分子辐射源

摘要

The gas discharge chamber (1) of the source of atomic beams or molecular beams serves to receive at least one target (2) and is connected via an extraction port (4) in a partition (5) to a substrate space (6) in which there is a substrate (3). The extraction port (4) is dimensioned and arranged in such a way that atomic beams and/or molecular beams originating from the target (2) enter from the chamber (1) into the substrate space (6). At the same time, transgression of the discharge from the chamber (1) into the substrate space (6) is suppressed thereby and a pressure difference between the chamber (1) and the substrate space (6) is maintained. The latter makes it possible to combine the advantages of cathodic sputtering with those of ion impact sputtering. The source can be produced inexpensively with small dimensions, is easy and reliable in handling and, above all, has a considerably enhanced productive capacity. The latter applies in particular with additional use of HF, a thermionic cathode, a deflection device for the removal of charged particles, a cooling device, and electric and/or magnetic fields. IMAGE
机译:原子束或分子束源的气体排放室(1)用于接收至少一个靶标(2),并通过隔板(5)中的抽气口(4)连接到衬底中的基板空间(6)。其中有一个基板(3)。提取口(4)的尺寸和布置方式使得源于靶标(2)的原子束和/或分子束从腔室(1)进入衬底空间(6)。同时,抑制了从腔室(1)进入基板空间(6)的排放,并保持了腔室(1)和基板空间(6)之间的压力差。后者使得可以将阴极溅射的优点与离子冲击溅射的优点相结合。该源可以以小尺寸廉价地生产,易于处理且可靠,并且最重要的是,具有显着提高的生产能力。后者尤其适用于HF,热电子阴极,用于去除带电粒子的偏转装置,冷却装置以及电场和/或磁场的附加使用。 <图像>

著录项

  • 公开/公告号DE2838676A1

    专利类型

  • 公开/公告日1979-03-29

    原文格式PDF

  • 申请/专利权人 ZENTRUM FUER ELEKTRONENMIKROSKOPIE;

    申请/专利号DE19782838676

  • 发明设计人 JAKOPICERICHDR.;

    申请日1978-09-05

  • 分类号H01J37/34;H01J37/30;

  • 国家 DE

  • 入库时间 2022-08-22 19:44:10

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