Polymeric composition having enhanced resistance to photodegradation and method of enhancing the resistance of an ultra-violet light-sensitive polymer to photodegradation

摘要

This invention provides a composition comprising a polymer which is sensitive to photodegradation by ultra- violet light and, in an amount sufficient to substantially stabilize said polymer against such photodegradition, a mixture containing at least one substituted decahydroquinoline functional polymer of the formulawherein R , R , and R are independently selected from alkyl groups containing 1 to 12 carbon atoms, a cyclohexyl group, or cyclohexylalkyl groups containing 7 to 14 carbon atoms; A is selected from the group consisting of alkyl groups containing 1 to 18 carbon atoms, alkoxy groups containing 1 to 12 carbon atoms in the group, ester groups containing a total of from 2 to 24 carbon atoms in the group, a cyclohexyl group, cyclohexylalkyl groups containing 7 to 14 carbon atoms in the group, hydroxy groups, amino groups and aminoalkyl groups and alkyl-substituted amino and aminoalkyl groups wherein the alkyl contains 1 to 12 carbon atoms; Z is a segment of the polymer backone derived from an olefinic monomer; x is 0, 1, 2 or 3; and B is hydrogen, an alkyl group containing 1 to 12 carbon atoms, a cyclohexyl group, or a cyclohexylalkyl group of 7 to 14 carbon atoms in the group; and m is at least 2 and at least one UV absorbing compound selected from the group consisting of benzotriazoles, benzoates and nickel phenolate complexes.;It also provides a method of enhancing the resistance of an ultra-violet light sensitive polymer to photodegradation which comprises incorporating therein a stabilizer of the general formula given above in an amount sufficient to substantially stabilise the polymer.