Promotion of epitaxial film growth - by forming stepped defect pattern on substrate surface

摘要

Before an epitaxial film is produced on a substrate, many groups of spot or stepped defects are produced on the surface in such a way that their envelopes lie vertical to the substrate surface and parallel to the envelope of adjacent spot defects. The envelope distance is made 1 mu and the envelopes intersect pref. at an angle which is an integral multiple of pi/6. This controls the formation of nuclei and the growth and orientation of the film to reduce the presence of defects and to produce a film at moderate temps.