首页> 外国专利> METHOD FOR MANUFACTURING SEMI-CONDUCTING DEVICES AND SEMI-CONDUCTING DEVICES THUS OBTAINED.

METHOD FOR MANUFACTURING SEMI-CONDUCTING DEVICES AND SEMI-CONDUCTING DEVICES THUS OBTAINED.

机译:所获得的制造半导电设备和半导电设备的方法。

摘要

Method for manufacturing a semi-conducting device, comprising a sensitive front side and a back side so arranged as to provide a ohmic contact, having a semi-conducting substrate, such as silicium, in the shape of a slice, which comprises making a junction on the front side of the semi-conducting substrate slice, by diffusing therein a doping material, coating the doped front side with an anti-reflecting material layer, covering by silk-screening the anti-reflecting material layer with a layer of a silver-based paste, applying by silk-screening over a large part at least of the back side from the semi-conducting substrate slice, a first layer formed by an aluminum paste, and applying by silk-screening over the first aluminum layer, a second layer the covering rate of whch lies between 10 and 40%, formed either by a paste on the basis of silver and palladium.
机译:用于制造半导体器件的方法,该半导体器件包括敏感的前侧和后侧,该敏感的前侧和后侧被布置为提供欧姆接触,该敏感的前侧和后侧具有片状的半导电衬底,例如硅,其包括形成结在半导体基片的正面上,通过在其中扩散掺杂材料,在掺杂的正面上覆盖抗反射材料层,并用一层银-丝网对抗反射材料层进行丝网印刷覆盖。基浆料,通过丝网印刷在半导电基板片的至少背面的大部分上,涂覆由铝浆料形成的第一层,并通过丝网印刷在第一铝层,第二层上涂覆糊状物的覆盖率在10%至40%之间,由银和钯基糊料形成。

著录项

  • 公开/公告号ES8501169A1

    专利类型

  • 公开/公告日1984-11-01

    原文格式PDF

  • 申请/专利权人 BELGE ETAT;

    申请/专利号ES19840530223

  • 发明设计人

    申请日1984-03-01

  • 分类号H01L31/18;

  • 国家 ES

  • 入库时间 2022-08-22 09:05:18

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号