首页> 外国专利> FOTOF¯LSOMT POLYMERMATERIALE, FREMGANGSM¨TE TIL ELEKTROFOR ETISK AVSETTING UNDER ANVENDELSE AV MATERIALET, SAMT ANVEN DELSE AV MATERIALET VED FREMSTILLING AV FILMER P¨ UNDERLAG

FOTOF¯LSOMT POLYMERMATERIALE, FREMGANGSM¨TE TIL ELEKTROFOR ETISK AVSETTING UNDER ANVENDELSE AV MATERIALET, SAMT ANVEN DELSE AV MATERIALET VED FREMSTILLING AV FILMER P¨ UNDERLAG

机译:光敏聚合物材料,使用该材料过程中的电道德沉积过程以及在制作支持电影的过程中使用该材料

摘要

The invention is directed to a photosensitive polymer composition capable of being electrophoretically depositable as an adherent, uniform photosensitive film on a conductive surface. The photosensitive polymer composition useful for electrodeposition is formed from an aqueous solution or emulsion of at least one polymer having charged carrier groups, a photoinitiator and a source of unsaturation for crosslinking the resulting film upon exposure to actinic radiation. The photosensitive film formed from the photosensitive polymer composition is aqueous developable and resistant to strong inorganic acids and strong bases. The photosensitive polymer composition is useful in the preparation of printed circuit boards, lithographic printing plates, cathode ray tubes, as well as in chemical milling, solder resist and planarizing layer applications.
机译:本发明涉及一种光敏聚合物组合物,该组合物能够以电泳方式沉积为导电表面上的粘附均匀的光敏膜。用于电沉积的光敏聚合物组合物由至少一种具有带电载体基团的聚合物,光引发剂和不饱和源的水溶液或乳液形成,所述不饱和源用于在暴露于光化辐射下交联所得膜。由光敏聚合物组合物形成的光敏膜是可水显影的并且对强无机酸和强碱具有抵抗力。该光敏聚合物组合物可用于制备印刷电路板,平版印刷版,阴极射线管以及化学研磨,阻焊剂和平坦化层应用。

著录项

  • 公开/公告号NO853738A

    专利类型

  • 公开/公告日1986-04-01

    原文格式PDF

  • 申请/专利权人 ROHM AND HAAS COMPANY;

    申请/专利号NO19850003738

  • 发明设计人 EMMONS WILLIAM DAVID;WINKLE MARK ROBERT;

    申请日1985-09-24

  • 分类号G03C;

  • 国家 NO

  • 入库时间 2022-08-22 07:40:51

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