首页> 外国专利> Solution a liquid, alkaline, aqueous cleaning circuit panels, a process for preparing a substrate resin for subsequent metalizacao, process for desunter aperfeicoado resin.Process for the cleaning of aperfeicoado perfuracoes, and process to attack the surface of a panel circuit.

Solution a liquid, alkaline, aqueous cleaning circuit panels, a process for preparing a substrate resin for subsequent metalizacao, process for desunter aperfeicoado resin.Process for the cleaning of aperfeicoado perfuracoes, and process to attack the surface of a panel circuit.

机译:解决液体,碱性,水性清洁电路板的问题,制备用于后续金属化的基材树脂的工艺,解开无纺布树脂的工艺,清洁无纺布泡沫塑料的工艺以及侵蚀面板电路表面的工艺。

摘要

A high concentration aqueous NaMnO4 solution which provides a high etch rate for printed circuit boards and the like. The solution contains NaOH in an amount sufficient to allow the removal of substantially all the manganese residues from the treated substrate by acid neutralization. The solution can be used inter alia for desmearing and etching back.
机译:高浓度NaMnO4水溶液可为印刷电路板等提供高蚀刻速率。溶液中含有的氢氧化钠的量足以通过酸中和从处理过的基质中除去基本上所有的锰残留物。该解决方案尤其可以用于去污和回蚀。

著录项

  • 公开/公告号BR8602230A

    专利类型

  • 公开/公告日1987-01-13

    原文格式PDF

  • 申请/专利权人 MORTON THIOKOL INC.;

    申请/专利号BR19868602230

  • 发明设计人 GERALD KRULIK;

    申请日1986-05-16

  • 分类号C09K13/00;C23C18/06;C23G1/14;C23F1/02;H05K3/06;H05K3/26;

  • 国家 BR

  • 入库时间 2022-08-22 07:21:39

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