首页> 外国专利> Solution a liquid, alkaline, aqueous, of namn04, process to prepare a substrate resin, process for desuntar aperfeicoado resin walls of holes.The process aperfeicoado for cleaning hole and process for attacking the part support surface of a panel circuit.

Solution a liquid, alkaline, aqueous, of namn04, process to prepare a substrate resin, process for desuntar aperfeicoado resin walls of holes.The process aperfeicoado for cleaning hole and process for attacking the part support surface of a panel circuit.

机译:溶液为namn04的液体,碱性,水性溶液,准备衬底树脂,对孔中的aperfeicoado树脂壁进行去Sunsun处理。用于清洁孔的aperfeicoado处理和对面板电路的零件支撑表面的浸蚀处理。

摘要

Aqueous, alkaline liquid NaMnO4 solutions are provided which provide excellent resin desmearing and etchback, especially in the manufacture of printed circuit boards. The solutions comprise water, alkali metal hydroxide, NaMnO4 and from about 0.1 to about 3.0 moles per mole of MnO4- of a co-ion for MnO4- selected from the group consisting of K+, Cs+, Rb+ and mixtures thereof.
机译:提供碱性水溶液NaMnO4,可提供出色的树脂去污和回蚀功能,特别是在印刷电路板的制造中。所述溶液包含水,碱金属氢氧化物,NaMnO 4和每摩尔MnO 4-约0.1至约3.0摩尔的MnO 4的共离子,选自K +,Cs +,Rb +及其混合物。

著录项

  • 公开/公告号BR8602231A

    专利类型

  • 公开/公告日1987-01-13

    原文格式PDF

  • 申请/专利权人 MORTON THIOKOL INC.;

    申请/专利号BR19868602231

  • 发明设计人 GERALD KRULIK;

    申请日1986-05-16

  • 分类号C09K13/00;C23C18/06;C23G1/14;C23F1/02;H05K3/26;

  • 国家 BR

  • 入库时间 2022-08-22 07:21:39

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