PURPOSE:To increase the yield of a reaction gas, by a method wherein one reaction chamber and the other reaction chamber are connected by a conduit in order to utilize the exhaust gas of the former as at least a part of the reactant gas of the latter. CONSTITUTION:Silane gas is intrdouced from an introducing valve 22 to form an amorphous silicon layer. Unreacted SiH4 gas is sent to a removing device 35 through a pump 34 through a valve 32 to remove the solid dust therein. In the next step, the gas is sent to gas mixers 14, 15 through a conduit 10 to be mixed with B2H6 introduced from a valve 16 and PH3 introduced from a valve 17 and the resulting mixture is respectively introduced into the first reaction chamber 11 and the third reaction chamber 13 through valves 21, 23 to be used for the formation of a P type amorphous silicon layer and an n type amorphous silicon layer.
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机译:目的:为了增加反应气体的产率,通过一种方法,其中一个反应室和另一个反应室通过导管连接,以便将前者的废气用作后者的反应气体的至少一部分。 。组成:将硅烷气体从引入阀22引入,以形成非晶硅层。未反应的SiH 4气体通过泵34通过阀32被送至去除装置35,以去除其中的固体灰尘。在下一步骤中,气体通过导管10被送至气体混合器14、15,以与从阀16引入的B 2 H 6和从阀17引入的PH 3混合,并将所得混合物分别引入第一反应室11和11。第三反应室13通过阀21、23用于形成P型非晶硅层和n型非晶硅层。
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