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Method of treating semiconductor wafers in a magnetically confined plasma at low pressure by monitoring peak to peak voltage of the plasma
Method of treating semiconductor wafers in a magnetically confined plasma at low pressure by monitoring peak to peak voltage of the plasma
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机译:通过监测等离子体的峰峰值电压在低压下在磁约束等离子体中处理半导体晶片的方法
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摘要
In a magnetically confined plasma, optimal pressure is found by measuring the peak to peak voltage of the plasma and looking for a distinct minimum in the peak to peak voltage. The pressure at which the minimum occurs can be used to calibrate a manometer used in the system.
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