Prodn. of boron nitride surface layer - comprises gas pulse deposition with boron tri:chloride mixed with Stoichiometric excess of ammonia in nitrogen@ atmos.

摘要

A BN surface layer is produced on a substrate by gas phase deposition with BC13 mixed with a stoichiometric excess of NH3 in an atmos. of N2 at 120-300 deg.C being passed over the substrate at the deposition temp. The gaseous mixt. is pref. first passed over a purificn. trap to remove Cl contg. impurities. The ratio NH3:BC13 is 7:1. ADVANTAGE - A simple process to form a homogeneous and uniform BN surface on a substrate