首页> 外国专利> ELECTRON-BEAM APPARATUS AND ELECTRON-BEAM REDUCTION AND TRANSFER APPARATUS

ELECTRON-BEAM APPARATUS AND ELECTRON-BEAM REDUCTION AND TRANSFER APPARATUS

机译:电子束装置和电子束减少与传输装置

摘要

PURPOSE: To make the whole spherical aberration smaller than a spherical aberration caused in an electron lens. ;CONSTITUTION: The title apparatus is provided with the following: an electron gun which is composed of a cathode 1 having a concave shape with reference to an emitted electron beam, of an anode 4 having a convex shape with reference to the cathode 1 and provided with an electron-beam passage hole and of a focusing electrode 2 converging the electron beam emitted from the cathode 1; and an electromagnetic lens 6. The spherical aberration, of a convex lens, which is caused by the electromagnetic lens 6 is offset by the spherical aberration, of a concave lens, which is caused by the electron guns 1, 2, 4.;COPYRIGHT: (C)1993,JPO&Japio
机译:目的:使整个球差小于在电子透镜中引起的球差。 ;组成:本标题装置具有:电子枪,其由相对于发射电子束具有凹形的阴极1,相对于阴极1具有凸形的阳极4构成。通过电子束通过孔和聚焦电极2,使从阴极1发射的电子束会聚。电磁透镜6引起的凸透镜的球差被电子枪1、2、4引起的凹透镜的球差抵消。 :(C)1993,JPO&Japio

著录项

  • 公开/公告号JPH05190430A

    专利类型

  • 公开/公告日1993-07-30

    原文格式PDF

  • 申请/专利权人 NIKON CORP;

    申请/专利号JP19920027325

  • 发明设计人 NAKASUJI MAMORU;

    申请日1992-01-17

  • 分类号H01L21/027;

  • 国家 JP

  • 入库时间 2022-08-22 05:16:18

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